ABSTRACT
Manually operated coating processes are becoming quite rare in modern material fabrication. Sputtering is an example of a widely used industrial thin film coating process. This chapter outlines a simple model for the basic reactive sputtering process referred to as 'Berg's model', first suggested 1987 by S. erg and his co-workers at Uppsala University. Compound formation at the target surface will only take place due to reactions between the reactive gas and the fraction of the target consisting of the unreacted target metal. To avoid the problem of controlling the composition of the deposited film in reactive co-sputtering it may be advantageous to carry out reactive sputtering from an alloy target. More detailed information of the reactive sputtering process may be included to form more advanced models of the reactive sputtering process. The chapter points out a few new ways of expanding the computer simulations of the reactive sputter deposition process.
