ABSTRACT
This chapter details photolithography as optical lithography and lithography are used interchangeably. Photolithography is the technology of patterning and enables complex integrated circuits to be manufactured on wafers. In semiconductor manufacturing, photolithography plays a prominent role in the scaling of feature size and is arguably the most important process step in determining the future longevity of Moore's law. Photolithography requires high resolution, high photoresist sensitivity, alignment with high precision and accuracy, exact process parameter control and low defect density. The short wavelengths of excimer lasers in the UV spectrum are ideal for photolithography applications in semiconductor manufacturing. The progress of shortening the wavelength of light for these processes is relatively slow and arguably threatens the perpetuation of Moore's law. Photolithography light sources used in semiconductor manufacturing challenge Moore's law and decrease the wavelength of operation, while maintaining high output power from these sources is challenging.
