chapter
PECVD: Silicon Nitride
ByDeborah Neumayer
Pages 11

An overview of amorphous hydrogenated silicon nitride (a-SiNx: H) prepared by plasma-enhanced chemical vapor deposition is discussed including applications, plasma deposition systems, characterization of films by Fourier transform infrared spectroscopy, mechanism of film growth as determined by process chemistry, and dependence of film properties on process parameters.