chapter
Atomic Layer Etching
BySebastian U. Engelmann
Pages 5

Semiconductor technology has continuously pushed plasma etch technology to better performance and higher precision. The advent of ×1-nm technology nodes is inadvertently demanding etch processes with control in single nanometer scale dimensions. The ever continuing trend to shrink device sizes even further and also the advent of novel materials, multicomponent materials, or even nanoscale materials is growing the need for the ultimate etch solution: etching with atomic layer precision.