ABSTRACT
Process simulation is the modeling of the fabrication of semiconductor devices such as transistors. e ultimate goal of process simulation is an accurate prediction of the active dopant distribution, the stress distribution, and the device geometry. Process simulation is typically used as an input for device simulation, the modeling of device electrical characteristics. Collectively, process and device simulation form the core tools for the design phase known as technology computeraided design (TCAD). Considering the design process as a series of steps with decreasing levels of abstraction, synthesis would be at the highest level and TCAD, being closest to fabrication, would be the phase with the least amount of abstraction. Because of the detailed physical modeling involved, process simulation is almost exclusively used to aid in the development of single devices-whether discrete or as a part of an integrated circuit.
