ABSTRACT
Experiment showed that the formation of porous silicon (PSi) with the required properties, and then keeping them unchanged for a long time regardless of the surrounding environment is a difficult task, which is not always acceptable. It was found that the properties of PSi not only depend on the etching conditions, but also depend on how the etching process ends, how PSi is dried and stored, and what treatment of PSi is used during fabrication and operation of the devices. All of this suggests that the achievement of reproducible results when using PSi needs careful consideration of all stages of the technological process, including the formation of PSi, drying, modification, stabilization, and storage. The process of PSi formation has been analyzed in detail in previous chapters. This chapter reviews the processes that form the final stage of PSi preparation for use in real devices.
