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High-κ Gate Dielectrics
DOI link for High-κ Gate Dielectrics
High-κ Gate Dielectrics book
High-κ Gate Dielectrics
DOI link for High-κ Gate Dielectrics
High-κ Gate Dielectrics book
Edited ByMichel Houssa
Edition 1st Edition
First Published 2004
eBook Published 17 June 2019
Pub. Location Boca Raton
Imprint CRC Press
Pages 614
eBook ISBN 9780429092886
Subjects Engineering & Technology, Physical Sciences
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Houssa, M. (Ed.). (2003). High-κ Gate Dielectrics (1st ed.). CRC Press. https://doi.org/10.1201/9781420034141
ABSTRACT
The drive toward smaller and smaller electronic componentry has huge implications for the materials currently being used. As quantum mechanical effects begin to dominate, conventional materials will be unable to function at scales much smaller than those in current use. For this reason, new materials with higher electrical permittivity will be requ
TABLE OF CONTENTS
section Section 1|1 pages
Introduction
section Section 2|1 pages
Deposition Techniques
chapter Chapter 2.3|34 pages
Pulsed laser deposition of dielectrics
ByDave H A Blank, Lianne M Doeswijk, Koray Karakaya, Gertjan Koster, Guus Rijnders
section Section 3|1 pages
Characterization
chapter Chapter 3.2|27 pages
Defects in stacks of Si with nanometre thick high-κ dielectric layers: characterization and identification by electron spin resonance
ByA Stesmans, V V Afanas’ev
chapter Chapter 3.3|34 pages
Band alignment at the interfaces of Si and metals with high-permittivity insulating oxides
ByV V Afanas’ev, A Stesmans
chapter Chapter 3.4|40 pages
Electrical characterization, modelling and simulation of MOS structures with high-κ gate stacks
ByJean-Luc Autran, Daniela Munteanu, Michel Houssa
section Section 4|1 pages
Theory
chapter Chapter 4.1|32 pages
Defects and defect-controlled behaviour in high-κ materials: a theoretical perspective
ByMarshall Stoneham, Alexander Shluger, Adam Foster, Marek Szymanski
chapter Chapter 4.2|47 pages
Chemical bonding and electronic structure of high-κ transition metal dielectrics: applications to interfacial band offset energies and electronically active defects
ByGerald Lucovsky, Jerry L Whitten
chapter Chapter 4.3|25 pages
Electronic structure and band offsets of high-dielectric-constant gate oxides
ByJ Robertson, P W Peacock
chapter Chapter 4.4|34 pages
Reduction of the electron mobility in high-κ MOS systems caused by remote scattering with soft interfacial optical phonons
ByMassimo V Fischetti, Deborah A Neumayer, Eduard A Cartier
chapter Chapter 4.5|36 pages
Ab initio calculations of the structural, electronic and dynamical properties of high-κ dielectrics
ByGian-Marco Rignanese, Xavier Gonze, Alfredo Pasquarello
chapter Chapter 4.6|30 pages
Defect generation under electrical stress: experimental characterization and modelling
ByMichel Houssa
section Section 5|1 pages
Technological Aspects
