ABSTRACT
This work comprises the proceedings of the Fourth Symposium on Particles on Surfaces. Papers cover: adhesion-induced deformations of particles on surfaces; the use of atomic force microscopy in probing particle-particle adhesion; particle contamination in microelectronics, on spacecraft, and on optical surfaces; the role of air ionization in reducing surface contamination by particles in the cleanroom; abrasive blasting media for contamination-free deburring processes; and more.;The book is intended for physical, chemical, surface and colloid chemists, materials scientists; polymers, plastics, electrical and electronics, computer, chemical and mechanical engineers; and upper-level undergraduate and graduate students in these disciplines.
