ABSTRACT

The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. This handbook is regularly updated with new material, and this volume presents additional recipe-type information (i.e. important deposition system details and process parameters) for optical materials.

part

In2O3:Sn

part X3.7

Ga2O3-In2O3

part X3.8

ZrO2

part X3.9

ZrOxFy

part X3.10

CeO2

part X3.11

CaF2

chapter X3.11.0

Introduction

Edited ByA Glocker David

part X3.13

MgO

chapter X3.13.0

Introduction

Edited ByA Glocker David

part X3.14

VO2

part X3.15

a-C:O:H

chapter X3.15.0

Introduction

Edited ByA Glocker David

chapter X3.15.1

PECVD of a-C:O:H films

Edited ByA Glocker David

part X3.16

SiO2

chapter X3.16.0

Introduction

Edited ByA Glocker David

chapter X3.16.1

Ion-beam sputtering of SiO2

Edited ByA Glocker David

part X3.17

Ta2O5

chapter X3.17.0

Introduction

Edited ByA Glocker David

chapter X3.17.1

Ion-beam sputtering of Ta2O5

Edited ByA Glocker David

part X3.18

SiO2/Si3N4/TiO2/Ag

chapter X3.18.0

Introduction

Edited ByA Glocker David

part X3.19

Cr/Si3N4

chapter X3.19.0

Introduction

Edited ByA Glocker David

part X3.20

HfO2

chapter X3.20.0

Introduction

Edited ByA Glocker David

chapter X3.20.1

Ion-beam sputtering of HfO2

Edited ByA Glocker David

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