ABSTRACT
The field of thin film deposition technology has burgeoned over the last few decades. At one time, only a few basic techniques were available; now, the thin film technologist is confronted by a vast array of process options, each with its respective strengths and weaknesses. Traditional methods, such as vacuum evaporation and sputter deposition, have evolved and branched into a large variety of related techniques, each highly specialized. Novel technologies have emerged, often offering alternative solutions to problems that have challenged us over the years. In this entry, it would be impossible to cover all of these techniques to the depth they deserve. Rather, the intention is to provide a comprehensive summary of the methods that are available for thin film deposition, together with an overview of the principles and equipment that are involved. The interested reader is encouraged to delve more deeply into any given area through the references.
