ABSTRACT
The earliest reports of CVD diamond growth by hot-filament chemical vapor deposition (HFCVD) were published in the early 1980s by Matsumoto et al. [1, 2]. A simple W filament was used in a flow tube, the substrate being heated both by the filament and by an external furnace. Since that time, the number of papers dealing with HFCVD has increased manyfold.
