ABSTRACT
Diamond thin films produced by chemical vapor deposition (CVD) are projected to have many future applications because of the unique properties of diamond [1]. The applications of diamond are often considered on the basis of the properties of natural diamond crystals. Natural diamond is known to be exceedingly hard and wear resistant, have high thermal conductivity and melting point, be optically transparent from the far infrared to the ultraviolet (5.5 eV), and have unique semiconducting properties. Common applications of diamond based on these properties are cutting tools, wear-resistant parts, medical coatings, heat sinks, acoustic response systems, inert optical coatings, and electronic and electro-optic devices. For this potential to be realized, the nucleation, growth, and resulting structure of diamond films need to be more thoroughly understood and controlled.
