ABSTRACT
In order to obtain double oxide films with corrosion resistance against both HCl and NaOH solutions, Al2O3–ZrO2 films were formed on Pt, Si and Al substrates by low pressure MOCVD techniques using Al(O–i–C3H7)2 and Zr(O–i–C3H7) as source gases and O2 as reaction gas. The films obtained were composed of double oxide with uniform in-depth composition. The changes in the corrosion resistance of the films were investigated as a function of film composition. The corrosion resistance of the films in 1m HCl and 1.0m NaOH increased with increasing cationic fraction of Zr, XZr , in the films. The films with XZr values larger than 0.62 hardly dissolved in both solutions. The double oxide coatings with such XZr values showed good protection of an Al substrate in 1.0m HCl. The coatings, however, showed poor protection in 1.0m NaOH. The two layer coating of the double oxide film gave relatively good protection in the NaOH solution.
