ABSTRACT
In recent years, the development of inexpensive solution-based chemical methods to synthesize the controlled nanostructures for various technological applications has gained enormous attention among the research community. Among all the solution-based methods, electrodeposition is regarded as one of the most versatile techniques, and has been widely used at lab-scale as well as industry level. Electrodeposition is highly regarded as a viable method in synthesizing various nanostructured thin films due to its simplicity, non-requirement of any sophisticated fabrication equipment, inexpensiveness, scalability, and the ability to control the surface morphology and film thickness by tuning the electrodeposition conditions. The chapter gives a brief introduction to the fundamental electrochemical principals and mechanisms involved in conventional electrodeposition techniques, such as anodic electrodeposition, metal anodization, cathodic electrodeposition, and potential cycling/pulsed electrodeposition with a few examples. The key electrodeposition parameters controlling the nanostructured morphology of deposited material, such as electrolyte precursor, electrode substrate, applied potential, and the annealing treatment are discussed. The major part of the chapter focuses on various approaches to synthesize various nanostructures by tailoring the electrodeposition parameters.
