ABSTRACT
The present study is devoted to investigate numerically the optical characteristics of multi-layer thin film structures such as Si/SiO2 and Ge/Si/SiO2 by using the characteristic transmission matrix method. The reflectivity and the absorption ratio for thin film structures are estimated for different incident angles of light and various film thicknesses. In addition, the influence of wavelength on optical characteristics is examined. It is found that such wave-like characteristics are observed in predicting reflectivity and depends mainly on film thickness. Moreover, in the present study, a film thickness for ignoring wave interference is estimated.
