ABSTRACT
Reactive sputtering of 90%In+10%Sn targets in both, classical and unballanced planar magnetrons, has been used for deposition of In-Sn-O (ITO) films. Optical emission spectra of the magnetron discharge in both configurations are compared. Effect of the post-deposition annealing on selected properties of ITO films is examined. The influence of a doping of the magnetron target on the film properties is discussed.
