ABSTRACT
Plasma polymerization is known as an unique method for organic thin film formation from most organic vapors, which is a dry process and makes uniform coating on flat and uneven substrates. Conventional polymethylmethacrylate (PMMA) is known as a highly resolvable electron beam resis. Effects of carrier gases on the plasma polymerization were studied using several gases. The gas pressure dependences of the peaks were different between type A and B reactor. Existence of three peaks in GPC spectra suggests that there are three reaction mechanisms. If active molecules are formed, they will be stabilized in the two ways, namely by the reaction between the active molecule and the source monomer and by the reciprocal reaction of active molecules. The monomer is probably similar to the active molecules. PPMA were performed by two gas flow type reactors and the polymerized films were characterized by using several analizing methods.
