ABSTRACT
Recently, the worldwide telecommunication industry is developing towards slighter and lighter technology. Thin film technology has been playing an important role in the field of miniaturization of various microwave devices and integration of various optical devices. Scientists and researchers have been giving intensive and continuous effort in the development of thin films. The dielectric thin films with good optical properties are used in the integrated optical device as antireflection coating, dielectric mirror, etc. Fabrication of thin-film capacitors using high dielectric constant materials can provide higher charge storage densities when they exhibit lower dielectric loss. Ferroelectric, piezoelectric oxide thin films of low leakage current, low hysteresis, and high stability are used in sensor and tunable microwave device applications. In this chapter, the recent progress in the fabrication of oxide thin films and their applications in different fields are discussed.
