ABSTRACT
Double-O-Tube (DOT) shield tunnelling is a technology developed to enable a more efficient use of the underground space and to shorten the time of tunnel construction. Its primary application in the past two decades has been in Japan and China, involving about twenty engineering cases, six of which are on the Shanghai metro system. This paper presents advanced finite element analysis of one of the DOT tunnelling cases on the Shanghai metro, focusing in particular on the development of a realistic ground model based on a systematic characterisation of the available laboratory and field experimental evidence.
