ABSTRACT
The aim of this chapter is to provide an overview of the development of 2D nanostructures using the atomic layer deposition (ALD) technique. Attention will be concentrated on the deposition of 2D semiconductor oxides (e.g., films with a thickness of a few monolayers or several monolayers) on conducting or semiconducting substrates (e.g., metal or silicon/silicon oxide substrate). The chapter explains interfacial and structural concepts in deposited 2D oxide films. The principles of ALD are introduced, focusing on the development of 2D nanostructures. In doing so, the ALD development of 2D WO3, TiO2, and Al2O3 oxides is discussed as the practical cases. The developed recipes can be used as technical examples and adjusted to deal with the other challenges in the development of 2D nanostructured semiconductor oxides. The chapter discusses the practical applications of ALD-developed 2D oxide semiconductors.
