ABSTRACT

The sensitivity of the ITO films prepared by electron shower increased exponentially with concentration of NO2, and the sensitivity was 130 at 500 ppm NO2. The sensitivity increased with decreasing the film thickness below 40nm. The sensitivity was highest at 250°C and the reproducibility was excellent. The sensitivity and the critical thickness of a film prepared by sputtering were lower than that prepared by electron shower. The surface roughness of the film prepared by electron shower was ten times higher, which affected the sensitivity.