ABSTRACT
Amorphous MoSi2 thin films have been produced by magnetron sputtering. The microstructural development during annealing and oxidation has been investigated by XRD, TEM and SEM. Films annealed at 500–1000°C exhibit microstructures consisting of the hexagonal C40 and /or tetragonal C11b MoSi2 phases depending on the annealing temperature. Oxidation at 500°C produced a mixed oxide which consisted of MoO3 and SiO2.
