ABSTRACT
Size-selected clusters from a cluster ion beam were used as nucleation sites for self-forming etching masks in silicon nanostructure production. The investigation of cluster deposition helps to understand the process of nucleation site formation. Therefore deposition experiments, performed in our laboratory, are reviewed in this article. These experiments show that it should be possible to produce ordered arrays of silicon pillars and silicon nanowires in a controlled way, as confirmed by preliminary results.
