ABSTRACT
The factors that limit the depth resolution in SIMS are discussed and experimental strategies for overcoming these limitations and achieving sub-nanometre depth resolution explored. Beam induced mixing processes are shown to be the main limitation to sub-nanometre depth resolution in some materials whereas surface and beam induced topography dominate in others. The development of a new generation of low energy ion beams and of novel analysis strategies such as the ‘bevel-and-linescan’ approach and the imaging of focused-ion-beam (FIB) milled cross-sections are described.
