ABSTRACT
This chapter compares the properties of the Thallium (Tl) firms with those for typical in situ Yttrium-123. It discusses Thallium chemistry to provide a perspective on the processing difficulties and then discuss a variety of the current techniques for Thallium film production. The chapter also discusses in situ films only briefly because of lack of success to date. In situ film growth for the Copper(II) oxide based high-temperature superconductors essentially entails deposition of the constituent elements, typically by laser ablation or sputtering, under sufficient oxygen partial pressure to eliminate intermetallic phases and produce a stoichiometric film. The chapter briefly discusses environmental stability and hazards. High-quality contacts have been obtained with thin-film Tl superconductors by a number of techniques.
