ABSTRACT
The use of Auger Electron Spectroscopy (AES) as a method for particle characterization is of great importance in the fields of metallurgy and semiconductor technology. High surface sensitivity and small analysis volume make AES the technique of choice for the characterization of sub-micrometer particles, because X-ray techniques approach the limit of their spatial and depth resolution. AES provides elemental identification of particles with a minimum of interference from the surrounding matrix. While Auger electron spectroscopy has been used for many years for particle analysis, the present high-brightness field emission electron sources allow for the routine analysis of particles of less than 100 nanometers. Potential problems due to backscatter can be overcome by using a lower energy primary electron beam. Using the surface sensitivity of Auger electron spectroscopy, particles encountered in semiconductor processing and metallurgical samples can be easily analyzed and unambiguously identified.
