ABSTRACT
An organic material was added to generate Ultrafine Bubble (UFB), and the state of UFB particles was investigated by the dynamic light scattering method, transmission electron microscopy, and resonance mass measurement method. Disappearance of UFBs was suppressed by the addition of organic material, and it was confirmed that the organic material adhered to the surface of UFBs. In the dynamic light scattering method, it is difficult to clarify the mechanism since bubbles and solid particles cannot be distinguished from each other. In order to promote the elucidation of the mechanism, a device configuration with high cleanliness is required as much as possible. Elution from fluorocarbon resin materials is well known in processes requiring care of foreign materials and metals like in the semiconductor industry. In one of the mechanisms, bubbles are stabilized by suppressing the out flux of gas from the bubbles into the water by the organic material adhering to the bubble surface.
