ABSTRACT
Physical vapor deposition refers to a variety of vacuum deposition methods used to deposit thin films by the condensation of a vaporized form of the desired film material onto various workpiece surfaces. This chapter provides the methods of vanadium dioxide (VO2) thin film preparation, including aspects of film quality, the difficulty of process control, target requirements, and whether the methods are suitable for doping. Fan et al. found that the obtained phases of VO2 could be controlled by adjusting the oxygen partial pressure during the deposition. Species produced by pulsed laser are high-energy species, which can assist in the in situ fabrication of oriented, epitaxial thin films, leading to pulse laser deposition becoming a more widely used method for the epitaxial growth of VO2 films. Electron beam deposition can be used to prepare multicomponent and high-purity films, benefiting from the fact that an electron beam can be accurately controlled and can directly affect the material to be evaporated.
