ABSTRACT
Lab proposed novel and energy-efficient application of ultrathin transition metal dichalcogenides (TMDCs) can be realized into practical devices if and only if wafer-scale production of these materials with uniform and high-quality is possible. During the last couple of years, intense research efforts have been invested to achieve large-area growth of TMDCs using primarily metal-organic chemical vapor deposition (MOCVD) and atomic layer deposition (ALD). Recent efforts using pulsed-MOCVD with the vertical-Ostwald ripening process facilities surface diffusion to cover the entire surface is the most promising method for mass production. However, a non-destructive, fast, and accurate measurement system that can quantify the uniformity and quality of ultrathin TMDCs is essential to bring low-energy efficient applications into reality. In the first part of this chapter, the recent advancement of wafer-scale synthesis of TMDC monolayer is reviewed. The second part explains the basics of spectroscopic ellipsometry and its application to mapping the thickness uniformity.
