ABSTRACT
This chapter explores the use of a multiphysics approach to model the sol–gel thin-film deposition, which is a versatile wet chemistry method for thin-film deposition and surface medication and may play an important role in additive manufacturing processes. It describes computer modeling of thin-film deposition using finite element analysis. The sol–gel thin-film deposition usually starts with the preparation of a solution by means of hydrolysis and condensation of the precursor chemical compounds, for example, metal alkoxides. The networks are embedded in a rectangular container through which the precursor sol–gel solution flows from one to the opposite side of the container under a constant pressure. The mass transport of the sol–gel solution in the model system is treated in the regime of laminar flow. The adsorption and desorption of the sol–gel precursor chemical are assumed to be governed by a thermally activated first-order chemical reaction.
