ABSTRACT
After the early work of Kern, developing the alkaline and acidic RCA-1 and RCA-2 cleans in 1965 [1,2], little fundamental change occurred in silicon wafer cleaning for 20 years. In the late 1980s, a recognition of the economic impact of contaminants in semiconductor processing drove a renaissance in cleaning technology. This renaissance continues to the present with the added requirement of environmental consciousness.
