ABSTRACT
Manufacturing practices for complementary metal oxide semiconductor (CMOS) devices are arguably the most demanding, well developed, and lucrative in history. Even so, it is well recognized that historic trends in device scaling that have continued since the 1960s are going to face serious challenges in the next several years. Current trends in Moore’s Law scaling are elucidated in detail in the Semiconductor Industry Association’s
The International Technology Roadmap for Semiconductors
.
