ABSTRACT
Inorganic oxides as imprinting matrices have received increasing attention [1] in recent years due in large part to their extreme structural rigidity,which is crucial for retention of imprinted information because it provides the sca¡old thatmechanically supports the functional group organization. As shown in Fig.1, the distance between cross-linking points in a silica monomer is much shorter than the distance between cross-linking points in a commonly used polymermonomer,ethylene glycol dimethacrylate (EGDMA).This allowssilica toachieveagreater cross-linkingdensity, resulting inaYoung’smodulusupto200times larger thanthatofcross-linkedEGDMA[2,3].
