ABSTRACT
Megasonics has been a widely accepted cleaning method for contamination-sensitive products for nearly 20 years. Megasonics was initially developed in the early 1940s as a result of U.S. Navy research into advanced sonar instrumentation for antisubmarine warfare. In the late 1970s, RCA adapted this technology for wafer cleaning, and by 1982 commercial megasonic cleaning equipment was being delivered to the semiconductor industry.
