ABSTRACT
The fabrication of commercially available nanostructured materials with two-digit nanometer scale regularity has recently attracted considerable attention in many diverse areas of nanotechnology [1-5]. In comparison to the time-intensive and complicated equipment-demanding ‘top-down’ nanopatterning techniques using electromagnetic radiations, charged particles and atomic force microscope (AFM) tips [6-14], the ‘bottom-up’ methods based on a molecular level ‘self-assembly’ to create supramolecular nanopattern structures have been considered as highly parallel and intrinsically fast nanopatterning techniques [15-19]. During the past
decades, therefore, block copolymers whose chemically different block components spontaneously self-assemble into ordered nanostructures with two-digit nanometer scale have attracted great attention for nanotechnological applications such as nanostructured networks and membranes for fuel cells, nanotemplates and scaffolds for the fabrication of nanometer scale arrays, photonic materials for visible light and high-density information storage media [20-23].
