ABSTRACT
Miniaturization in electronic industry, biomolecules immobilization and tissue engineering in biotech applications, MEMS transition to nanofabrication [1], optoelectronic devices, conducting polymer/organic material devices, and materi-
als with extreme properties (superhydrophilic, superhydrophobic, superoleophilic, etc.) [2-4] require specific nanotopographies of the substrates. Many studies have demonstrated that nanotopographies (nano-grains, -pores, -particles, -ridges or -valleys) stimulate enhanced possible responses from cells compared to conventional (nanosmooth) materials [5]. In spite of the advantages of nanotopography and chemistry, the relative influence of nanotopography versus chemistry on cell responses has not been well distinguished to date. Various methods have been developed for nanotopography generation [6, 7]. However, these techniques are expensive, time consuming (require many steps), restricted to certain kinds of materials [8] and have limited size/shape control of the nanostructures on the surface. Cold plasma have been used traditionally as a step in nanotopographies/nanopatterns manufacturing [9-13], especially as reactive ion etching of pre-deposited or selfassembled patterned masks into surface. Recent reports investigate the direct use of plasma for nanopatterning of silicone-based and nanocomposite materials [14], and self-assembled layers of special polymers on surfaces [15] or of direct polymer surfaces [16].
