ABSTRACT

Abstract While organic compounds with polymerizable structure are required for conventional way of polymerization, any organic compound can be used for plasma-assisted polymerization process. In this study, polysiloxane thin films were obtained from a Cold Remote Nitrogen Plasma polymerization of 1,1,3,3tetramethyldisiloxane monomer with and without premixing with oxygen. This reactive medium, far from the discharge, allows to obtain high deposition rate. The films deposited in the present work are characterized by Fourier Transform Infra-red Spectroscopy, X-ray Photoelectron Spectroscopy, Atomic Force Microscopy, Scanning Electron Microscopy and thermo-gravimetric analysis. Their thermo-chemical behaviour is also studied after an in situ plasma assisted post-treatment and after an ex situ thermal post-treatment. A total mineralization of the coating occurs only after a thermal treatment at 600◦C and in this case the film structure looks like silica. After the plasma post-treatment, the uppermost layer tends towards a silica structure while the core of the coating remains unchanged. The efficiency of the polysiloxane film as a fire retardant coating for Polyamide-6 nano-composite substrates is evidenced. Fire retardant properties are studied from Limiting Oxygen Index (LOI) tests and cone calorimetry measurements.