ABSTRACT
The main challenge in the fabrication process of nano antenna arrays is therefore the implementation of a large number of terahertz rectifying devices, which are required to convert the terahertz alternating current induced in the antennas by the infrared radiation into a direct current. This chapter brings the basic process steps of the nanotransfer-printing process. The main challenge that has to be overcome is the adhesion force. Since the materials that are to be transferred onto the target substrate have to be easily delaminated from the stamp, the surface energy of the stamp has to be reduced as much as possible. The chapter demonstrates the transfer-printing of arrays of nano antenna structures using either molecular beam epitaxy (MBE) stamp or a patterned nonpolar materials stamp featuring an excellent morphology and reliable electrical resistivity. A scanning electron microscope and a probe station were used to characterize transfer-printed antenna structures fabricated with an MBE stamp.
