Advanced material science & engineering The characteristic of Ga-doped ZnO nanorods photodetectors

First, our glass substrate was used RCA method to clean residue, after that ZnO seed layer with a 100 nm-thick was deposited on glass by radio frequency magnetron sputtering. Subsequently, Au film with a 50 nm thick was thermally evaporated through an interdigitated shadow mask onto the ZnO seed layer to form contact electrodes. Further, the GZO nanorods are grown by hydrothermal method at 90 °C for 6 h.