ABSTRACT
In this chapter, the authors discuss the role of self-assembled monolayers (SAMs) in the fabricating electronic devices and the role of nanowires grown on microelectromechanical system (MEMS) devices. They illustrate the synergistic effect of combining the top-down and bottom-up approaches to keep up with scaling demands as well as open up new possibilities for emerging nanoelectronic device platforms. The authors utilize SAMs of porphyrins as a means unto the end goal of keeping up with scaling laws, which are dictated by top-down processes. This has been illustrated through the following application cases: Porphyrin SAM as a copper diffusion barrier for advanced complementary metal–oxide semiconductor technologies and fabrication of unipolar graphene field-effect transistors. The authors discuss the integration of bottom-up approaches with the MEMS platforms. True integration of top-down and bottom-up processes provides an opportunity to leverage the paradigm of bottom-up fabrication which is complementary to positional alignment and system complexity afforded by top-down fabrication and assembly.
