ABSTRACT
This chapter focuses on the Silicon Nanotubes (SiNT) which is a highly desired form of silicon for its fundamental role in the miniaturization trend of electronic devices. It describes the properties and applications of SiNTs and their fabrication methods and also focuses on chemical vapor deposition (CVD) template synthesis that is the most usual method for this material. The chapter also describes galvanic template synthesis as a general method for the fabrication of different metal and oxide nanostructures. It details the use of this technique for synthesizing SiNTs. Characterization methods will be described, confirming that template galvanic synthesis is a valuable tool for fabricating SiNTs because it has been found to be a very simple and cheap route in comparison with the other techniques. In addition, it is an easily scalable process that is the major advantage in light of industrial production.
