ABSTRACT
This chapter introduces the origin of nanopores and the classification of nanopores. It also introduces the anisotropic wet-etching method in detail in this section. Material deposition methods can be generally subdivided into the following methods: It should be noticed that the shrinkage process introduced by material deposition may increase the length of the nanopore, especially cylindrical nanopores. The chapter focuses on the detecting and controlling methods based on silicon-based nanopore sequencing devices. It introduces several nanopore-based electrical methods to detect the sequence of a DNA molecule, as well as the major challenges of these methods. Thus, the ionic blockade current detection method sets high requirements for solid-state nanopore morphology and fabrication technologies. The chapter focuses on the pyramidal silicon-based nanopores and nanopore arrays with their origin, basic formation principle and fabrication process, electrical detecting methods, common controlling methods of the DNA molecule, and their potential future application.
