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Chapter

Hole
                                Accelerator for III-Nitride Light-Emitting Diodes

Chapter

Hole Accelerator for III-Nitride Light-Emitting Diodes

DOI link for Hole Accelerator for III-Nitride Light-Emitting Diodes

Hole Accelerator for III-Nitride Light-Emitting Diodes book

Hole Accelerator for III-Nitride Light-Emitting Diodes

DOI link for Hole Accelerator for III-Nitride Light-Emitting Diodes

Hole Accelerator for III-Nitride Light-Emitting Diodes book

ByZi-Hui Zhang, Yonghui Zhang, Xiao Wei Sun, Wengang Bi
BookHandbook of Solid-State Lighting and LEDs

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Edition 1st Edition
First Published 2017
Imprint CRC Press
Pages 14
eBook ISBN 9781315151595

ABSTRACT

In this chapter, we propose a hole accelerator, which is made of a polarization mismatched p-electron-blocking layer (EBL)/p-GaN/p-Al x Ga1−x N heterojunction. By setting III-nitride-based blue light-emitting diodes (LEDs) as examples, the effectiveness of the hole accelerator with different designs (i.e., the AlN composition in the p-Al x Ga1−x N layer and the thickness for the p-GaN layer and p-Al x Ga1−x N layer) on the hole injection is probed. According to our findings, the energy that the holes obtain does not monotonically increase as the AlN incorporation in the p-Al x Ga1−x N layer increases. Meanwhile, for x > 15% in our case, the energy that the holes gain increases and then reaches a saturation level as increasing the p-GaN layer or p-Al x Ga1−x N layer thickness. Therefore, the hole injection efficiency and device efficiency are very sensitive to the p-EBL/p-GaN/p-Al x Ga1−x N design, and the hole accelerator can effectively increase the hole injection if properly designed.

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