ABSTRACT

This chapter is devoted to porous anode aluminum oxide and its structure, properties, and application in semiconductor technology. Types of aluminum oxide films formed during anodizing, structure of anode aluminum oxide films, mechanism of porous structure formation, and influence of anodizing parameters on the structure of anode aluminum oxide film are described in detail in this chapter. In addition, the use of porous aluminum oxide to obtain nanostructures of semiconductors is presented in the end of the chapter.