ABSTRACT
In this chapter, an overview of defects in sputtered thin films with an emphasis on hillocks and porosity is presented. Then, fractal approaches of studying hillocks and porosity are described with emphasis on the methodology and tools of the analyses. Generally, based on the experience of the authors and the case studies in this chapter, defects in thin films exhibit both mono-fractal and multifractal characteristics. The procedures illustrated in this chapter can be adopted by the industry to understand the evolution and detection of structural defects and their characteristics in thin films, which is very useful for control and enhancement of the quality of the sputtered thin films.
