ABSTRACT
In this chapter, mono-fractal approaches of studying the roughness of sputtered thin films are presented. The chapter provides an overview of the relationship between the vertical and lateral roughening of thin films during sputtering and then presents case studies illustrating this relationship. General relationships are discussed and supported with the experimental results from the literature. While, the influence of sputtering parameters to the fractal characteristics of thin films is illustrated by citing results from the author’s previous works and other published literature. Finally, the fractal nature of multilayered thin films grown via sputtering technologies are briefly described.
