ABSTRACT
In this chapter, a classification of thin film morphologies obtained, mostly, via physical vapor deposition (PVD) methods has been presented. Columnar, ballistic, fibrous, and pile-up particles are the common possible morphologies for thin films growth. Then, atomic force microscopy (AFM) images for synthetic films as per the classifications have been generated and the fractal characterizations (both mono-fractal and multifractal) are undertaken on each one of them. Autocorrelation, height–height/structure, power spectral density (PSD) functions, and Minskowski functionals have been used as the mono-fractal characterizations whereas the multifractal spectrum, mass exponent, and generalized multifractal functions have been used for multifractal analysis. A step-by-step methodology for prediction of growth and properties of thin film morphology based on fractal theory has been presented. The chapter will be a very resourceful reference during the interpretation of fractal results of thin film topography.
