ABSTRACT
Structural defects in silica were always the subject of particular interest since the defects play an important, if not crucial, role in the physicochemical properties of silica and ultimately in its performance in technological applications. The defects are important not only for the electrical and optical characteristics of silica, which largely depend on defects in the silica bulk. Defects on and in oxide films are commonly discussed in terms of “point” and “line” defects. Defects in monolayer silicate films grown on Ru(0001) are structurally richer. Domain boundaries dominate the defect structure in monolayer films on Ru(0001). Its origin has been addressed by reflection high-energy electron diffraction measurements combined with STM. The similarity of amorphous bilayer silicate films and the RN model of vitreous silica inspired further analysis of the amorphous films which is henceforth considered as a two-dimensional analog of the silica glass.
