ABSTRACT

This chapter discusses the principles of mass spectrometric methods that are applicable in the measurement of residual gases in vacuum as well as general chemical analyses of materials. Similar to total pressure measurements, the techniques of partial pressure measurements are classified in groups of direct and indirect methods. Mass spectrometers are used in partial pressure measurement of gases in vacuum. These devices analyzing gases in vacuum are called residual gas analyzers. The reactive gases of vacuum background may incorporate into the growing structures in amounts proportional to their partial pressures. Particularly, electronic properties of semiconductors can change dramatically with impurities introduced into their microstructures. In high vacuum, the major component of residual gases is water vapor, which is reactive with many materials that are prepared under vacuum conditions. The reactive gases of vacuum background may incorporate into the growing structures in amounts proportional to their partial pressures.