ABSTRACT

This chapter reviews different types of three-dimensional atomic force microscopy (3D-AFM) measurements for semiconductor metrology. It covers different implementations of 3D atomic force microscopes, calibrations methods, measurement uncertainty con­ siderations, and applications. The goal is to outline key aspects of 3D atomic force microscopes for dimensional semiconductor measure­ ments in a way that is accessible to both new and experienced users and gives readers a strong foundation for further study.