ABSTRACT
This chapter reviews different types of three-dimensional atomic force microscopy (3D-AFM) measurements for semiconductor metrology. It covers different implementations of 3D atomic force microscopes, calibrations methods, measurement uncertainty con siderations, and applications. The goal is to outline key aspects of 3D atomic force microscopes for dimensional semiconductor measure ments in a way that is accessible to both new and experienced users and gives readers a strong foundation for further study.